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ChessBase Fritz Trainer MONSTER DVD Collection (FritzTrainer Chess) SDVL 83 >>> DOWNLOAD


ChessBase Fritz Trainer MONSTER DVD Collection (FritzTrainer Chess) SDVL 83 >>> DOWNLOAD







Category: ChessBase products Category: Chess software Category: Programmes Category: Software Category: Softimage Category: Windows multimedia software1. Field of the Invention The present invention relates to a method and apparatus for stabilizing the output of an ultraviolet (UV) radiation source used in a photolithography system. 2. Background Art In the semiconductor industry, there is a continuing trend toward higher device densities. To accomplish such high device densities there has been and continues to be efforts toward scaling down device dimensions (e.g., at submicron levels) on semiconductor wafers. In order to be able to reduce the size of components that form semiconductor devices (e.g., transistors, capacitors, etc.), the capability to form such components with precise dimensions becomes increasingly important. Photolithography is commonly used to form various features on a semiconductor wafer. Typically, photolithography includes forming a photoresist layer on a semiconductor wafer. The photoresist layer is then selectively exposed to radiation to transfer the pattern for the integrated circuit to the photoresist layer. The selective exposure of the photoresist to radiation can be accomplished by passing radiation through a reticle that has a pattern formed thereon corresponding to the features to be formed in the photoresist layer. The reticle is positioned between the radiation source and the photoresist layer. Radiation is reflected off the reticle and is incident upon the photoresist layer. Radiation that is incident upon the photoresist layer is subsequently selectively removed (e.g., through a mask process) to form the pattern of the integrated circuit. The remaining photoresist layer, after the pattern of the integrated circuit is formed, is then typically developed and used to protect the semiconductor wafer during the formation of additional semiconductor devices and/or layers of material thereon. The radiation source, such as a UV radiation source, used in photolithography is typically a short wavelength light source. The use of such short wavelength light sources, however, causes the radiation emanating from the radiation source to become more unstable. For example, the wavelength of the radiation from a UV radiation source can vary as a function of intensity of the radiation. The intensity of the radiation can vary based on factors including the temperature of the radiation source. In general, the higher the temperature of the radiation source, the more unstable the radiation output. Moreover, in certain photolithography systems, including immersion photolith



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